產(chǎn)品展示
產(chǎn)品分類(lèi)
聯(lián)系方式
適用領(lǐng)域：集成電路、先進(jìn)封裝、化合物半導(dǎo)體 Relevant Industries: Integrated Circuits, Advanced Packaging, Compound Semiconductors 適用材料: ?Si、SiC、GaN Suitable for Processing: Silicon (Si), Silicon Carbide (SiC), Gallium Nitride (GaN) 晶圓尺寸：12/8/6英寸 Wafer Size: 8/6 inch 適用工藝：氧化(Oxidation)、退火(Annealing)、固化(Polyimide)、 合金(Alloy)、擴(kuò)散(Diffusion) Applicable Processes: High-Temperature Annealing
適用領(lǐng)域：集成電路、先進(jìn)封裝、化合物半導(dǎo)體 Relevant Industries: Integrated Circuits, Advanced Packaging, Compound Semiconductors 適用材料: ?Si、SiC、GaN Suitable for Processing: Silicon (Si), Silicon Carbide (SiC), Gallium Nitride (GaN) 晶圓尺寸：12/8/6英寸 Wafer Size: 8/6 inch 適用工藝：氮化硅(SiN)、多晶硅(Poly-Si/U-Poly/D-Poly)、 二氧化硅(TEOS)、HTO等 Applicable Processes: Silicon Nitride (SiN) Deposition, Polysilicon(Poly-Si / U-Poly /D-Poly) Deposition, Silicon Dioxide (TEOS) Deposition, HTO, etc.
? 適用領(lǐng)域：化合物半導(dǎo)體 Relevant Industries: Compound Semiconductors ?適用材料：SiC Suitable for Processing: Silicon Carbide (SiC) ?晶圓尺寸：8/6英寸 Wafer Size: 8/6 inch ?適用工藝：高溫退火(Annealing) Applicable Processes: High-Temperature Annealing Applicable process: Annealing of SiC and GaN wafers
?適用領(lǐng)域：化合物半導(dǎo)體 Relevant Industries: Compound Semiconductors ?適用材料：SiC Suitable for Processing: Silicon Carbide (SiC) ?晶圓尺寸：8/6英寸 Wafer Size: 8/6 inch ?適用工藝：高溫氧化(Oxidation) Applicable Processes: High-Temperature Oxidation
?適用領(lǐng)域：集成電路、先進(jìn)封裝 Relevant Industries: Integrated Circuits, Advanced Packaging ?適用材料：Si、SiC Suitable for Processing: Silicon (Si), Silicon Carbide (SiC) ?晶圓尺寸：12/8/6英寸 Wafer Size: 12/8/6 inch ?適用工藝：氮化硅(SiN)、多晶硅(Poly-Si/U-Poly/D-Poly)、二氧化硅(TEOS)、HTO等 Applicable Processes: Silicon Nitride (SiN) Deposition, Polysilicon (Poly-Si / U-Poly / D-Poly) Deposition, Silicon Dioxide (TEOS) Deposition, HTO, etc.
? 適用領(lǐng)域： ?集成電路、先進(jìn)封裝 Relevant Industries: Integrated Circuits, Advanced Packaging ? 適用材料: ?Si、SiC Suitable for Processing: Silicon (Si), Silicon Carbide (SiC) ?晶圓尺寸: ?12/8/6英寸 Wafer Size: 12/8/6 inch ?適用工藝: ?氧化(Oxidation)、退火(Annealing)、固化(Polyimide)、合金(Alloy)、擴(kuò)散(Diffusion) Applicable Processes: ?Oxidation, Annealing, Polyimide Curing, Alloy, Diffusion
適用領(lǐng)域： ?單晶生長(zhǎng) Relevant Industries:Single Crystal Growth 適用材料: ?Ga2O3、GaAs、InP等 Suitable for Processing: Ga2O3 (Gallium Oxide), GaAs (Gallium Arsenide), InP (Indium Phosphide) etc. 晶圓尺寸: ?12/8/6英寸 Wafer Size: 12/8/6 inch
適用領(lǐng)域：?jiǎn)尉L(zhǎng)、外延生長(zhǎng) Relevant Industries: Single Crystal Growth, Epitaxial Growth 適用材料: ?GaN（單晶）、AIN（單晶/外延）、Ga2O3（外延）、GaAs（外延） Suitable for Processing: GaN (single crystal),AlN (single crystal / epitaxial)Ga2O3 (epitaxial), GaAs (epitaxial) 晶圓尺寸: ?12/8/6/4英寸 Wafer Size: 12/8/6/4 inch
適用領(lǐng)域：?jiǎn)尉L(zhǎng)、外延生長(zhǎng) Relevant Industries: Single Crystal Growth, Epitaxial Growth 適用材料: ?GaN（單晶）、AIN（單晶/外延）、Ga2O3（外延）、GaAs（外延） Suitable for Processing: GaN (single crystal),AlN (single crystal / epitaxial)Ga2O3 (epitaxial), GaAs (epitaxial) 晶圓尺寸: ?12/8/6/4英寸 Wafer Size: 12/8/6/4 inch